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A Tale of Two Fabs

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This article, published in an industry-newsletter (the Bartlett Bay Newsletter), discusses the protocols for cleanroom procedures and benefits for wafer yields.
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A Tale of Two Fabs

Not long after the introduction of minienvironments for 300mm-semiconductor processes, minienvironment manufacturers promised ISO Class 1 or 2 enclosures that isolate the product from the main source of cleanroom particulates: people!  Consequently, some semiconductor manufacturers believed these claims and relaxed their cleanroom gowning standards; others were a little more skeptical.

Having conducted numerous airborne particle tests within different 300mm fabs, data shows that relaxing cleanroom-gowning standards will affect wafer yields.  Conversely, the semiconductor fabs that still employ ISO Class 4 or 5 (Fed. Std 209E Class 10 or 100) gowning procedures, can maintain higher wafer yields.
I do not think anyone will argue against the value of minienvironments, but comprehensive data has shown that product wafers suffer significant die kills when cleanroom gowning procedures are relaxed.

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300mm Wafer